• Title of article

    Damage induced in materials by ion implantation

  • Author/Authors

    Mathur، نويسنده , , M.S. and McKee، نويسنده , , J.S.C. and Liu، نويسنده , , M. and He، نويسنده , , D.، نويسنده ,

  • Pages
    5
  • From page
    25
  • To page
    29
  • Abstract
    Surface damage caused in palladium and kapton by the implantation of 20 keV D2+ ions, fiuence- 1011 ions cm−2, has been investigated utilizing the technique of atomic force microscopy. TRIM program has been used to calculate the vacancies and interstitials created during implantation.
  • Keywords
    Ion implantation , Surface damage , atomic force microscopy
  • Journal title
    Astroparticle Physics
  • Record number

    2064549