Title of article
Numerical study and optimization of chemical vapor deposition process in fabricating zinc selenide films
Author/Authors
Vorobʹev، نويسنده , , A.N. and Garibin، نويسنده , , E.A. and Khoruzhnikov، نويسنده , , S.E. and Mironov، نويسنده , , I.A.، نويسنده ,
Pages
6
From page
204
To page
209
Abstract
The numerical study and optimization of chemical vapor deposition process in fabricating zinc selenide films were carried out on the basis of the three-dimensional transport equations for low Mach number flows. The optimization technics was developed and the optimum regimes were found.
Keywords
chemical vapor deposition , Zinc selenide , optimization
Journal title
Astroparticle Physics
Record number
2065958
Link To Document