MICROSTRUCTURAL STUDY OF SILICON NITRIDE WHISKERS PRODUCED BY NITRIDATION OF PLASMA-SPRAYED SILICON LAYERS

plasma-sprayed silicon layers have been used to produce silicon nitride layers with fibrous microstructure which optimizes fracture toughness and strength. SEM examination of the specimens shows that the surface is covered by fine needles and whiskers of Si3N4. In order to study the oxygen contamination effect as well as other contaminants introduced during spraying and nitridation processes, surface sensitive analysis techniques like AES and XPS have been used to determine concentration of these contaminants.