Title of article :
Active joining of Ti–6Al–4V with electroplated Cu thin film
Author/Authors :
Li، نويسنده , , J.H Chern Lin، نويسنده , , R.Y، نويسنده ,
Pages :
12
From page :
39
To page :
50
Abstract :
Joining of Ti–6Al–4V with thin film copper fillers was developed using an active infrared processing technique. The process includes rapid infrared heating of the specimen to 1125 °C, and holding at that temperature for 60 s in flowing argon without vacuum, then followed by rapid cooling. The copper thin film filler was electroplated to various thicknesses: 1, 2, 4 and 8 μm. Excellent wetting between copper and Ti–6Al–4V was observed in all joints. High joint shear strengths were obtained for all joints. The highest joint strength, 616±10 MPa, was obtained with 2 μm filler thickness. This joint strength is significantly higher than the shear strength of pure copper, 174 MPa, or Ti–6Al–4V, 542 MPa. When the filler material was only 1 μm, the joint zone was not completely filled. X-ray diffraction analysis on the as fractured joint surface revealed the presence of intermetallic compounds when joined with 4 and 8 μm copper fillers but it disappeared when joined with 1 and 2 μm copper fillers.
Keywords :
Joining affected zone , Active infrared processing , Ti–6Al–4V , Joint shear strength , Intermetallic compounds , Widmanst?tten structure
Journal title :
Astroparticle Physics
Record number :
2067654
Link To Document :
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