Title of article
Ion-beam-induced electrical conductivity in plasma-polymerized aniline film
Author/Authors
Tong، نويسنده , , Zhi Shen and Wu، نويسنده , , Mei Zhen and Pu، نويسنده , , Tian Shu and Zhou، نويسنده , , Fu and Liu، نويسنده , , Hui Zhen، نويسنده ,
Issue Information
دوماهنامه با شماره پیاپی سال 1995
Pages
7
From page
125
To page
131
Abstract
Plasma-polymerized organic films starting from aniline have been prepared. Characteristics of the films have been examined in detail using FT-IR, X-ray photoelectron spectroscopy (XPS), near-IR to UV spectroscopy and nuclear analysis techniques. While irradiation by 100 keV Ar+ ions at high fluence induces electrical conduction due to damage, doping of the plasma-polymerized aniline film with 24 keV I+ implantation at a fluence of 1 × 1016 ions/cm2 results in a decrease of electrical resistivity by twelve orders of magnitude. A threshold-like dependence of resistivity on the ion fluence has been found for the plasma-polymerized film irradiated by 100 keV Ar+ ions, similar to conventional polymers.
Keywords
Conductivity , Aniline , Ion Beam , Film , PLASMA
Journal title
Synthetic Metals
Serial Year
1995
Journal title
Synthetic Metals
Record number
2068825
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