Title of article
Synthesis and applications of sulfonated polyaniline
Author/Authors
Shimizu، نويسنده , , S. and Saitoh، نويسنده , , T. and Uzawa، نويسنده , , M. and Yuasa، نويسنده , , M. and YANO، نويسنده , , K. and Maruyama، نويسنده , , T. and Watanabe، نويسنده , , K.، نويسنده ,
Issue Information
دوماهنامه با شماره پیاپی سال 1997
Pages
2
From page
1337
To page
1338
Abstract
We present new synthesis and applications of fully-sulfonated polyaniline(SPAN), a self-doped conducting polymer. It is difficult to make polymers of aniline sulfonic acids(ASA) with a high molecular weight, since reactivity of ASA as a monomer is low due to the presence of an electron attractive sulfonic group. We prepared a high molecular weight poly(aniline sulfonic acid)(PAS) with a high yield by polymerizing the ASA having an electron donative group under basic conditions. The conducting polymer materials based on this polymer were developed for a variety of applications including;
oated Film for Resists (aquaSAVE®) — Charge prevention for e-beam lithography and improvement of post-exposure delay(PED) latitude for Chemical amplified resists.
tive Bottom Layers of Multi level Resists — Reduction of gate oxide damage in metal etching, etc.
Keywords
Polyaniline and derivatives , Ab inito quantum chemical methods and calculations , E-Beam Lithography
Journal title
Synthetic Metals
Serial Year
1997
Journal title
Synthetic Metals
Record number
2070957
Link To Document