Title of article :
Origin of the n-type field effect in polyaniline and oligoaniline thin films
Author/Authors :
Paloheimo، نويسنده , , J. and Stubb، نويسنده , , H.، نويسنده ,
Issue Information :
دوماهنامه با شماره پیاپی سال 1997
Pages :
5
From page :
51
To page :
55
Abstract :
We analyse the n-type field effect recently reported for protonated, layer-by-layer self-assembled polyaniline and oligoaniline thin films. An agreement is obtained between the experiments and a model, valid for three-dimensional variable-range hopping in a parabolic Coulomb gap. The results suggest that the wave-function decay length ξ and/or the dielectric constant ε vary with the position of the Fermi level (EF), with a positive derivative dln[ξ(EF)ε(EF)]/dEF in the order of a few eV−1. The apparent discrepancy between the p-type doping and n-type field effect is explained by the electron-hole asymmetry characteristic for aniline derivatives.
Keywords :
Polyaniline and derivatives , Field effect , SELF-ASSEMBLY , Transistors , variable-range hopping , Coulomb gap
Journal title :
Synthetic Metals
Serial Year :
1997
Journal title :
Synthetic Metals
Record number :
2071525
Link To Document :
بازگشت