Author/Authors :
Mandai، نويسنده , , Makiko and Takada، نويسنده , , Kenji and Aoki، نويسنده , , Toru and Fujinami، نويسنده , , Tatsuo and Nakanishi، نويسنده , , Yoichiro and Hatanaka، نويسنده , , Yoshinori، نويسنده ,
Abstract :
The dependence of the surface morphology of triphenyldiamine derivative (TPD) thin films on the deposition rate was observed by atomic force microscopy (AFM). Moreover, electroluminescent (EL) properties as a function of the TPD deposition rate were also measured. It was found that a deposition rate of around 3 إ/s is the optimum for the flatness of the films and EL properties.
Keywords :
atomic force microscopy , Triphenyldiamine derivative , Thin films , surface morphology , Thermal annealing , electroluminescence
