Nanopatterning of self-assembled monolayers on Si-surfaces with AFM lithography

Ammonium chloride-modified monolayer was prepared on negatively charged Si-wafer surfaces with 1,12-diaminododecane (DAD)·2HCl by self assembly method and methyl modified monolayer was prepared with n-tridecylamine (TDA)·HCl. The nano-patterns of these monolayers at the various anodization conditions demonstrated that the anodic reaction on DAD·2HCl monolayer has an enhancement effect to generate the protruding lines. The film thickness measurements suggest that DAD·2HCl monolayer was assembled completely on negatively charged Si-wafer surface in 1 mM of DAD·2HCl aqueous solution after 5 min. The completely assembled monolayer generated discrete and uniform protruding lines by atomic force microscopy (AFM) anodization.