Title of article :
The growth of PANI films at 450 MPa
Author/Authors :
Shen، نويسنده , , L.J. and Gu، نويسنده , , D.W. and Li، نويسنده , , J.S. and Zhou، نويسنده , , H.Y. and Xiao، نويسنده , , Paul W.R. and Yang، نويسنده , , N.R.، نويسنده ,
Issue Information :
دوماهنامه با شماره پیاپی سال 2005
Pages :
6
From page :
110
To page :
115
Abstract :
A series of polyaniline (PANI) films were prepared on quartz substrates by in situ polymerization with different reaction time under 450 MPa of hydrostatic high pressure. For investigating the effect of high pressure on the growth of the films, two additional series of samples with comparable conditions under ambient pressure were synthesize. The aniline cation radicals nucleated within 2 min and the polyaniline films grew within 10 min at 450 MPa of pressure. This compared with about 10 min for nucleation and 60 min for growth of polyaniline films under comparable ambient conditions. The process of PANI film growth under high pressure was obviously different from that in ambient pressure case. The high pressure used in polymerization affected directly the electrical property, the morphology, and growth of the films. A formation model of polyaniline film growth in high pressure case was proposed.
Keywords :
Polyaniline , Film growth , in situ polymerization , high pressure
Journal title :
Synthetic Metals
Serial Year :
2005
Journal title :
Synthetic Metals
Record number :
2082548
Link To Document :
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