X-ray photoemission spectroscopy of thin films

Developments in XPS (X-ray photoemission spectroscopy) over the past few years have seen, above all other surface analytical techniques, a successful bridging of the gap between ideal (single crystal) research and practical materials analysis. There has been a number of improvements in spectroscopic resolution through advances in both light sources (e.g. synchrotron) and analyser/detector design together with orders of magnitude refinement in the spatial resolution of the new breed of imaging spectrometers. As a result, in combination with in situ film growth techniques, a large range of film features can be examined with relative simplicity. These include interface chemistry and structure, electronic characterisation and quantifiable chemical imaging. All of which can be achieved through state-of-the-art commercially available instrumentation. A number of general improvements have been made in XPS over the past few years and in practical applications, in the area of thin film and coatings.