Title of article :
Atomic layer epitaxy
Author/Authors :
Niinistِ، نويسنده , , Lauri، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1998
Pages :
6
From page :
147
To page :
152
Abstract :
Atomic layer epitaxy is now a mature technique offering, through its self-limiting character, distinct advantages for materials processing especially when precise layer thickness control or conformal coating is needed. The technique is well suited for binary compounds and their doping but it is also applicable to more complex thin film structures. With a broadening range of materials processed by atomic layer epitaxy, new applications are emerging in electronics, optics and catalysis.
Keywords :
ALE atomic layer epitaxy , SILAR successive ionic layer adsorption and reaction , ECALE electrochemical atomic layer epitaxy , TFEL thin film electroluminescence , YBCO YBa2Cu3O7?x
Journal title :
Current Opinion in Solid State and Materials Science
Serial Year :
1998
Journal title :
Current Opinion in Solid State and Materials Science
Record number :
2088360
Link To Document :
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