Title of article :
Amorphisation processes in silicon
Author/Authors :
Müller، نويسنده , , Gerhard، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1998
Pages :
7
From page :
364
To page :
370
Abstract :
Amorphisation damage, a by-product of the ion-implantation process, has plagued silicon device technologists for more than three decades. More recently, physicists have become aware of the fact that ion bombardment of amorphised silicon represents an ideal model system for elucidating fundamental properties of both pure and hydrogenated silicon random networks.
Journal title :
Current Opinion in Solid State and Materials Science
Serial Year :
1998
Journal title :
Current Opinion in Solid State and Materials Science
Record number :
2088412
Link To Document :
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