Title of article :
Amorphisation processes in silicon
Author/Authors :
Müller، نويسنده , , Gerhard، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1998
Abstract :
Amorphisation damage, a by-product of the ion-implantation process, has plagued silicon device technologists for more than three decades. More recently, physicists have become aware of the fact that ion bombardment of amorphised silicon represents an ideal model system for elucidating fundamental properties of both pure and hydrogenated silicon random networks.
Journal title :
Current Opinion in Solid State and Materials Science
Journal title :
Current Opinion in Solid State and Materials Science