Title of article
Strain-induced metallic behavior in PrNiO3 epitaxial thin films
Author/Authors
Venimadhav، نويسنده , , A. and Chaitanya Lekshmi، نويسنده , , I. and Hegde، نويسنده , , M.S.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2002
Pages
8
From page
201
To page
208
Abstract
Electrical transport properties of RNiO3 (R=Pr, Nd, Sm) thin films grown by pulsed laser deposition have been studied. RNiO3 films grow in the (1 0 0) direction on a LaAlO3 (1 0 0) substrate. Unlike the polycrystalline solid, PrNiO3 films showed metallic behavior. The first-order metal-to-insulator transition observed in polycrystalline solids is suppressed in RNiO3 films. The effect of lattice strain in the films influencing the transport properties has been studied by varying the thickness of PrNiO3 film on LaAlO3 (1 0 0) and also by growing them on SrTiO3 (1 0 0) and α-Al2O3 (1 1̄ 0 2) substrates. Deviation in the transport properties is explained due to the strain-induced growth of the films. Further, we show that the transport property of a LaNiO3 film is also influenced by a similar strain effect.
Keywords
A. Thin films
Journal title
Materials Research Bulletin
Serial Year
2002
Journal title
Materials Research Bulletin
Record number
2095631
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