Title of article
Electron beam lithography and reactive ion etching of nanometer size features in niobium films
Author/Authors
Piotrowski، نويسنده , , T.T. and Piotrowska، نويسنده , , A. and Kami?ska، نويسنده , , E. and Szopniewski، نويسنده , , Z. and Kole?nik، نويسنده , , Sasi S. and Wrobel، نويسنده , , J. and Gier?owski، نويسنده , , P. and Lewandowski، نويسنده , , S.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
3
From page
171
To page
173
Abstract
The fabrication of nanostructures in niobium thin films has been developed. Optimisation of process technology concerned pattern generation in e-beam sensitive AZ PF514 resist and pattern transfer by reactive ion etching (RIE) in CCl2F2/H2 plasma. By adjusting the process, parameters Nb bridge structures with dimensions down to 80 nm and anisotropic rectangular arrays of antidots of 125-nm average diameter have been fabricated. Magnetisation curves measured on the structured Nb films strongly suggest formation of anisotropic vortex lattices in the system of anisotropic array of antidots.
Keywords
Electron-beam-based nanopatterning , Reactive Ion Etching , Superconducting films
Journal title
Materials Science and Engineering C
Serial Year
2001
Journal title
Materials Science and Engineering C
Record number
2097344
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