Author/Authors :
Sotomayor Torres، نويسنده , , C.M. and Zankovych، نويسنده , , S. and Seekamp، نويسنده , , J. and Kam، نويسنده , , A.P. and Clavijo Cedeٌo، نويسنده , , C. and Hoffmann، نويسنده , , T. and Ahopelto، نويسنده , , J. and Reuther، نويسنده , , F. and Pfeiffer، نويسنده , , K. and Bleidiessel، نويسنده , , G. and Gruetzner، نويسنده , , G. and Maximov، نويسنده , , M.V. and Heidari، نويسنده , , B.، نويسنده ,
Abstract :
A status report of nanoimprint lithography is given in the context of alternative nanofabrication methods. Since the ultimate resolution of nanoimprint appears to be determined by the stamp, this is discussed in detail, particularly the recent developments on polymer stamps. The scope of the technique is illustrated with applications in passive optical structures and organic devices. Throughout the report, critical dimensions are discussed, as well as other challenges facing nanoimprint lithography.
