Title of article :
Formation of nanosize poly(p-phenylene vinylene) in porous silicon substrate
Author/Authors :
Le Rendu، نويسنده , , P. and Nguyen، نويسنده , , T.P. and Cheah، نويسنده , , K. and Joubert، نويسنده , , P.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2003
Pages :
4
From page :
847
To page :
850
Abstract :
We report the results of optical investigations in porous silicon (PS)/poly(p-phenylene vinylene) (PPV) systems obtained by filling the pores of silicon wafers with polymer. nning electron microscopy (SEM), IR, and Raman spectroscopy, we observed that the porous silicon layer was thoroughly filled by the polymer with no significant change in the structure of the materials. This suggests that there is no interaction between the components. On the other hand, the photoluminescence (PL) spectra of the devices investigated at different temperatures (from 11 to 290 K) showed that both materials are active at low temperatures. Porous silicon has a band located at 398 nm while PPV has two bands at 528 and 570 nm. As the temperature increases, the PL intensity of porous silicon decreases and that PPV is blue shifted. A new band emerging at 473 nm may indicate an energy transfer from the porous silicon to PPV, involving short segments of the polymer. The band of PPV located at 515 nm becomes more dominant and indicates that the nanosize polymer films are formed in the pores of the silicon layer, in agreement with the results obtained by SEM, IR, and Raman analyses.
Keywords :
PPV , Photoluminescence , Infrared , Raman , Porous silicon
Journal title :
Materials Science and Engineering C
Serial Year :
2003
Journal title :
Materials Science and Engineering C
Record number :
2098136
Link To Document :
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