Author/Authors :
Park، نويسنده , , Lee Soon and Choi، نويسنده , , Hyung-Suk and Kim، نويسنده , , Woo-Sik and Lee، نويسنده , , Dong-Ho and Min، نويسنده , , Kyung-Eun and Seo، نويسنده , , Kwan-Ho and Kyu Kang، نويسنده , , Inn and Park، نويسنده , , Soo-Young and Ho Hwang، نويسنده , , Sung and Kwon، نويسنده , , Younghwan، نويسنده ,
Abstract :
A new method of fabricating electrophoretic display sheet was developed utilizing a photolithographic process. In this method, stripe-type barrier ribs with height of 50–80 μm and gap between ribs of 100–150 μm were patterned on the transparent electrode substrate by photolithographic process using a negative-type photoresist. Microspheres dispersed in UV curable monomer system were closely packed into the spaces between the barrier ribs. After laminating the upper ITO film, the resulting sheet was UV-irradiated to give an electrophoretic display panel with uniform packing of microspheres.
