Title of article :
Photoelectrochemical and physical properties of tungsten trioxide films obtained by aerosol pyrolysis
Author/Authors :
Sadale، نويسنده , , S.B. and Chaqour، نويسنده , , S.M and Gorochov، نويسنده , , O. and Neumann-Spallart، نويسنده , , M.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Pages :
8
From page :
1472
To page :
1479
Abstract :
Aerosol pyrolysis (AP) was used for preparing semiconducting films of tungsten trioxide using peroxotungstic acid as a precursor. The films were characterized by SEM, XRD, and by their photoelectrochemical response. Porous, polycrystalline (monoclinic) films of thickness up to 3 μm were prepared. An incident photon to current efficiency (IPCE) of 0.55 at 365 nm was obtained for films of 1 μm thickness on conducting F:SnO2/glass substrates under depletion conditions, in junctions with aqueous electrolytes. The spectral (photocurrent) response extended into the visible region (up to 470 nm) which is of importance for solar applications like photocatalysis.
Keywords :
A. Thin films , A. Semiconductors , A. Oxides , D. Electrochemical properties
Journal title :
Materials Research Bulletin
Serial Year :
2008
Journal title :
Materials Research Bulletin
Record number :
2098886
Link To Document :
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