Author/Authors :
Lupan، نويسنده , , O. and Chow، نويسنده , , L. and Shishiyanu، نويسنده , , S. and Monaico، نويسنده , , E. and Shishiyanu، نويسنده , , T. and Sontea، نويسنده , , V. and Roldan Cuenya، نويسنده , , B. and Naitabdi، نويسنده , , A. and Park، نويسنده , , S. and Schulte، نويسنده , , A.، نويسنده ,
Abstract :
Nanostructured ZnO thin films have been deposited using a successive chemical solution deposition method. The structural, morphological, electrical and sensing properties of the films were studied for different concentrations of Al-dopant and were analyzed as a function of rapid photothermal processing temperatures. The films were investigated by X-ray diffraction, scanning electron microscopy, energy dispersive X-ray spectroscopy, X-ray photoelectron and micro-Raman spectroscopy. Electrical and gas sensitivity measurements were conducted as well. The average grain size is 240 and 224 إ for undoped ZnO and Al-doped ZnO films, respectively. We demonstrate that rapid photothermal processing is an efficient method for improving the quality of nanostructured ZnO films. Nanostructured ZnO films doped with Al showed a higher sensitivity to carbon dioxide than undoped ZnO films. The correlations between material compositions, microstructures of the films and the properties of the gas sensors are discussed.
Keywords :
D. Electrical properties , A. Nanostructures , B. Chemical synthesis , A. Oxides