Title of article :
Cathodoluminescence study in AlxGa1 − xN structures
Author/Authors :
Nasr، نويسنده , , F. Ben and Matoussi، نويسنده , , A. and Guermazi، نويسنده , , S. and Fakhfakh، نويسنده , , Z.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Pages :
5
From page :
618
To page :
622
Abstract :
In this work, we consider a 2D model for calculation of cathodoluminescence in GaN-based structures. This model is developed using an extended generation profile and taking into account the influence of the carrier diffusion process, internal absorption and some radiative recombination processes. First, we have investigated the effect of hole diffusion length and the surface recombination velocity on the CL spectra of GaN sample grown at 800 °C by MOVPE method. Then, we have calculated the dependence of CL intensity from AlGaN alloys as a function of Al content and the electron beam energy. s show a red shift of the CL peaks when the beam energy is varied from 2 to 10 keV at room temperature. The band-edge emission of AlxGa1 − xN shifts about 0.49 eV when the Al composition is increased from x = 0.18 to 0.38. Comparison of the experimental spectra with simulations shows a good agreement.
Keywords :
diffusion length , cathodoluminescence , Recombination , nitrides , Photoluminescence
Journal title :
Materials Science and Engineering C
Serial Year :
2008
Journal title :
Materials Science and Engineering C
Record number :
2099364
Link To Document :
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