Effect of Ta2O5/TiO2 thin film on mechanical properties, corrosion and cell behavior of the NiTi alloy implanted with tantalum

The NiTi shape memory alloy has been modified by plasma immersion ion implantation (PIII) with Ta at different incident currents to improve the corrosion resistance and other surface and biological properties. The surface topography, chemical components, mechanical properties, corrosion resistance and cytocompatibility are investigated. Atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) revealed that Ta implantation led to the formation of compact Ta2O5/TiO2 nano-film on the surface of the NiTi alloy. The results of Auger electron spectroscopy (AES) showed that Ni was suppressed in the superficial surface layer of the modified NiTi alloy samples. The results of nano-indentation illustrated a lower level of nano-hardness and Youngʹs modulus after Ta implantation. Potentiodynamic anodic polarization curves showed that the corrosion resistance of NiTi alloys was enhanced by Ta implantation. Cells reached confluency and a double-layered structure had developed after cultured for three days. The NiTi alloy modified by a moderate incident current possesses a uniform and slippery surface morphology and the largest surface roughness, leading to the best corrosion resistance and the highest cell proliferation rate, respectively.