Title of article
Thermal stability of nanocrystalline Ni
Author/Authors
Klement، نويسنده , , U. and Erb، نويسنده , , U. and El-Sherik، نويسنده , , A.M. and Aust، نويسنده , , K.T.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1995
Pages
10
From page
177
To page
186
Abstract
Thermal stability of electroplated nanocrystalline Ni of 10 and 20 nm grain size was investigated by differential scanning calorimetry (DSC). The temperature dependence and heat release ΔH during grain growth have been determined by linear anisothermal measurements (linear heating at 10 K min−1). The corresponding change in microstructure has been monitored in the temperature range between 373 K and 693 K using transmission electron microscopy (TEM). The TEM and DSC studies identified three exothermic reactions: “nucleation” and abnormal grain growth (353–562 K), normal grain growth (562–593 K) and growth towards equilibrium (643–773 K). The grain growth behaviour, and the similar heat releases ΔH = 18 J g−1, and 16 J g−1 measured for the 10 nm and 20 nm Ni nanocrystals respectively in the DSC experiments may be related to the observed sulphur segregation at grain boundaries and triple junctions.
Keywords
thermal stability , microstructure , grain growth , nickel
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Serial Year
1995
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Record number
2130772
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