Title of article :
The influence of oxygen in phosphine on electrical properties of undoped InGaAlP layers grown by MOCVD
Author/Authors :
Polyakov، نويسنده , , A.Y. and Chelniy، نويسنده , , A.A. and Smirnov، نويسنده , , N.B. and Govorkov، نويسنده , , A.V. and Milnes، نويسنده , , A.G. and Li، نويسنده , , Xiaolei and Aluev، نويسنده , , A.N. and Orlov، نويسنده , , P.B.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1996
Pages :
5
From page :
36
To page :
40
Abstract :
The presence of oxygen in phospjine during MOCVD growth of undoped layers of InGaAlP is shown to produce a high resistivity of the samples and to lead to the formation of various deep states, most notably defects with energy levels of about Ec − 0.5eV.
Keywords :
Oxygen , Electrical properties , Semiconductors , MOCVD , phosphine
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Serial Year :
1996
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Record number :
2131462
Link To Document :
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