Title of article :
Field ion microscopy observation of intrinsic stacking faults in iridium
Author/Authors :
Song، نويسنده , , S.G. and Chen، نويسنده , , C.L. and Tsong، نويسنده , , T.T.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1996
Abstract :
An intrinsic stacking fault in Ir is characterized using FIM techniques. Lattice distortion in the vicinity of the partial dislocation loop bounding the fault is evaluated. The maximum radius of visible distortion in the vicinity of the partial dislocation is found to be ∼4.6 nm. This result provides experimental data for the assessment of the magnitude of lattice disturbance caused by crystal defects, which can be useful in the computer modeling of crystal defects.
Keywords :
iridium , Field ion microscopy , Intrinsic stacking fault
Journal title :
MATERIALS SCIENCE & ENGINEERING: A
Journal title :
MATERIALS SCIENCE & ENGINEERING: A