Title of article
Capacitance transient studies of electron irradiated 4H-SiC
Author/Authors
Hemmingsson، نويسنده , , Edmond C. and son Brandt، نويسنده , , N.T. and Kordina، نويسنده , , O. and Janzén، نويسنده , , E. and Lindstrِm، نويسنده , , J.L. and Savage، نويسنده , , S. and Nordell، نويسنده , , N.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1997
Pages
4
From page
336
To page
339
Abstract
Deep level defects in electron-irradiated 4H-SiC epilayers grown by chemical vapor deposition (CVD) were studied using deep level transient spectroscopy (DLTS). DLTS measurements performed on electron-irradiated p + n junctions in the temperature range 100–7.50 K have revealed seven electron traps. Most of these defects were already observed at a dose of irradiation as low as 5 × 1013 cm−2. Dose dependence and annealing behaviour of the defects were investigated. For two of these electron traps, the capture cross section was measured.
Keywords
Capture , chemical vapor deposition , Ionisation energy , Cross Section
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
1997
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2132419
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