Title of article
Thermal annealing of interface traps and trapped charges induced by irradiation in oxides of 3C-SiC metal-oxide-semiconductor structures
Author/Authors
Yoshikawa، نويسنده , , M. and Nemoto، نويسنده , , N. and Itoh، نويسنده , , H. and Nashiyama، نويسنده , , I. and Okumura، نويسنده , , H. and Misawa، نويسنده , , S. and Yoshida، نويسنده , , S.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1997
Pages
6
From page
218
To page
223
Abstract
Thermal annealing of interface traps induced by 60Co gamma-ray irradiation has been studied for cubic silicon carbide (3C-SiC) metal-oxide-semiconductor (MOS) structures using high-frequency capacitance-voltage (C—V) method. The isochronal annealing behaviors of interface traps and trapped charges in oxides induced by irradiation are found to decrease with increasing temperature. The annealing behaviors up to 400°C are analyzed and the activation energies are determined using the isochronal annealing formula derived from the rate equation of the chemical reaction. The annealings of the interface traps and trapped charges in oxides near the 3C-SiC/SiO2 interface are discussed in terms of the activation energies obtained.
Keywords
Trapped charges in oxygen , Interface trap density , Isochronal annealing , Irradiation , C—V , gamma-rays , Thermal annealing
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
1997
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2132515
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