Photoluminescence properties of nanocrystalline AlN layers grown by pulse plasma assisted CVD

In this work, results of photoluminescence and absorption measurements on pulse plasma assisted CVD layers of AlN are presented. We studied nanocrystalline layers grown on silicon substrate at a temperature of 300 K. The efficient photoluminescence of nanocrystalline AlN layers, obtained under non optimal conditions, i.e. relatively low excitation energy, seems to be promising for light emitting applications of this material.