Title of article :
The initial stage of electron field emission from CVD diamond implanted with nitrogen
Author/Authors :
Shao، نويسنده , , Lexi and Xie، نويسنده , , Erqing and He، نويسنده , , Deyan and Chen، نويسنده , , Guanghua، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Pages :
5
From page :
83
To page :
87
Abstract :
Electron field emission characteristics from chemical vapor deposition (CVD) diamond thin films implanted with nitrogen have been investigated. It is shown that the formation of a stable emission from these films is characterized by a three-stage process of breakdown of the implanted layer, activation of the emitter and turn-on of the stable emission. On the basis of the experiment results, a modified activation model has been suggested to analyze the mechanisms of the emission.
Keywords :
CVD diamond film , Nitrogen ion implantation , electron field emission , Activation model
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Serial Year :
1999
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Record number :
2134022
Link To Document :
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