Effects of MgO annealing process in a vacuum on the discharge characteristics of AC PDP

This paper deals with the relationships between various annealing conditions in a vacuum and the surface glow discharge characteristics on the MgO thin film prepared by e-beam evaporation method. The minimum discharge inception voltage is obtained for the sample annealed at 400°C for about 2 h in a clean vacuum. Above the annealing temperature of 430°C, cracks are founded on the MgO film, which results in higher discharge voltage. Moreover, the lower the annealing pressure, the lower the discharge voltage. The main factors that improves the discharge characteristics by annealing process is considered to be due to both the morphology changes or crystal structure of the MgO thin films and pumping impurities in the MgO film during the annealing process.