Title of article
Heteroepitaxial growth of 3C-SiC on SOI for sensor applications
Author/Authors
Krِtz، نويسنده , , G and Mِller، نويسنده , , H and Eickhoff، نويسنده , , M and Zappe، نويسنده , , Margit Ziermann، نويسنده , , R and Obermeier، نويسنده , , E and Stoemenos، نويسنده , , J، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1999
Pages
6
From page
516
To page
521
Abstract
Typical industrial high temperature sensor applications are reviewed and a short overview of the different high temperature sensor technologies is given. The pros and cons are weighted. Silicon carbide on insulator (SiCOIN) technology comes out to be the most attractive, provided the state of development can be brought up to the one of silicon and silicon on insulator (SOI). Due to the lack of commercially available SiC on SOI wafers, a new SiC on SOI technology has been developed. It is based on the precursor gas methylsilane. The low temperature growth process is described and in-situ n-type doping, which is necessary for sensor applications, has been carried out successfully over a wide range of concentrations without loosing the good crystal properties. Actually the full process is being transferred from a test reactor to a 4 inch machine. This should provide 3C-SiC on SOI wafers for commercial sensor applications. A demonstrator of combustion pressure sensor dedicated to pressure-based engine control is shown. Results of the pressure sensor fitted in a motor-test setup are summarized.
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
1999
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2134168
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