Title of article :
Effects of low dimensions on junction parameters of MOS devices
Author/Authors :
M. Faurichon de la Bardonnie، نويسنده , , M and Toufik، نويسنده , , N and El-Tahchi، نويسنده , , Pierre and Pelanchon، نويسنده , , F and Mialhe، نويسنده , , P، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2000
Abstract :
The electrical properties of the drain–substrate diode of submicronic devices are shown to be related to the device geometrical structure. The analysis takes into account two-dimensional edge effects. Intrinsic parameters are extracted from current–voltage characteristics and obtained dependant on the gate length and width. A degradation of the electrical properties is discussed and edge effects are related to small gate surface.
Keywords :
MOSFET , Submicronic , junction , characterization
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Journal title :
MATERIALS SCIENCE & ENGINEERING: B