Title of article
Surface roughness studies on 4H-SiC layers grown by liquid phase epitaxy
Author/Authors
Kuznetsov، نويسنده , , N. and Tsagaraki، نويسنده , , K. and Bauman، نويسنده , , D. and Morozov، نويسنده , , A. and Nikitina، نويسنده , , I. and Ivantsov، نويسنده , , V. and Zekentes، نويسنده , , K.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
3
From page
345
To page
347
Abstract
The surface roughness on 4H-SiC layers grown by LPE was systematically studied. The surface morphology was investigated by scanning electron microscopy and atomic force microscopy. Depending on the substrate orientation two different types of growth morphology were found: terraced and step flow growth. The height of growth steps was found to depend on the angle of the substrate off-orientation. The higher the degree of substrate off-orientation the higher the step height. The terrace height depends on the impurity concentration in LPE layers. With the decrease of the impurity level, the terrace height has been significantly decreased.
Keywords
silicon carbide , liquid phase epitaxy , Surface roughness
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
2001
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2136699
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