• Title of article

    Deep levels introduced in n-GaN grown by the ELOG technique by high-energy electron irradiation

  • Author/Authors

    Goodman، نويسنده , , S.A and Auret، نويسنده , , F.D and Myburg، نويسنده , , L and Legodi، نويسنده , , M.J and Gibart، نويسنده , , P and Beaumont، نويسنده , , B، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2001
  • Pages
    3
  • From page
    95
  • To page
    97
  • Abstract
    We have used deep level transient spectroscopy (DLTS) to investigate the electron trap defects introduced in n-GaN grown, using the epitaxial lateral overgrowth technique during high-energy electron irradiation from a 90Sr radionuclide source. The results indicate that, apart from the major defect with an energy level at 0.20 eV below the conduction band (supposed to be related to the VN), at least four other defects with energy levels centered about 0.90±0.15 eV, are introduced. From modeling, ignoring temperature dependent capture cross-section effects we have determined their activation energies, and temperature independent capture cross sections, commonly known as the DLTS signature.
  • Keywords
    Electron trap defects , GaN , DLTS , electron irradiation
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: B
  • Serial Year
    2001
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: B
  • Record number

    2137034