Title of article
Nucleationless island formation in SiGe/Si(100) heteroepitaxy
Author/Authors
Sutter، نويسنده , , P and Lagally، نويسنده , , M.G، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2002
Pages
4
From page
45
To page
48
Abstract
The formation of faceted three-dimensional (3-D) islands during growth of Si1−xGex alloys on Si(100) has been investigated by low-energy electron microscopy (LEEM). The formation of the islands in this alloy system does not involve 3-D nucleation, but rather proceeds continuously via a precursor array of shallow, stepped mounds on the surface that result from the inherent morphological instability of the strained alloy film.
Keywords
Silicon , Islands , epitaxy , Germanium , Roughening , Quantum dots
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
2002
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2137925
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