Structural defects and dislocation-related photoluminescence in erbium-implanted silicon

Structural defects and optical features of p-type CzSi after implantation of erbium ions with 1 MeV energy and 1×1014 cm−2 dose followed by annealing at (620–1100 °C) for 0.5–1.0 h in chlorine-containing atmosphere (CCA) or argon have been studied by transmission electron microscopy (TEM), optical microscopy in combination with selective chemical etching, and photoluminescence (PL). High temperature annealing in the chlorine-containing ambience gives rise to perfect prismatic dislocation loops as well as 60° and pure edge dislocations with dominant dislocation-related lines in the PL spectrum. Pure edge dislocations are responsible for the appearance of the lines. The Er-related lines due to the intra-4f shell transitions in the rare earth ions dominate in the PL spectra and no structural defects are observed after high temperature annealing in argon. The role of the intrinsic point defects in the transformation of structural defects and optically active centers is discussed.