Electrodeposition route to prepare graphite-like carbon nitride

Carbon nitride thin films were deposited on Si(1 0 0) substrate from saturated acetonitrile solution of 2,4,6-trichloro-1,3,5-triazine and 2,4,6-triamino-1,3,5-triazine by electrochemistry route at room temperature. The films were characterized by X-ray photoelectron spectroscopy (XPS), Fourier transform infrared spectroscopy (FTIR), and X-ray diffraction (XRD). These results indicate that crystalline g-C3N4 was obtained in the as-deposited films. The molar ratio of precursors in the reaction system had effects on the chemical composition, chemical bond states of C and N, and crystal structure of samples.