Preparation of TiO2 thin film by liquid sprayed mist CVD method

Titanium dioxide (TiO2) thin film was synthesized on α-Al2O3 (0 0 0 1) substrate by liquid sprayed mist chemical vapor deposition under 1 atm. Tetraethylorthotitanate [TEOT, (C2H5O)4Ti] was used as starting material. The liquid source to synthesize TiO2 thin film was prepared from dissolving the starting materials in 2-methoxyethanol. The TiO2 thin film was obtained as the amorphous phase at 300 °C and crystalline anatase type TiO2 above 400 °C. The crystal of thin film was mainly oriented to (1 1 2) plane. The degree of (1 1 2) orientation, the thickness, and the surface roughness of the film were strongly dependent on the substrate temperature and deposition time. By the controlling the substrate temperature and deposition time, TiO2/α-Al2O3 (0 0 0 1) films with preferred orientation were successfully fabricated, and the film deposition rate was about 10 nm/min.