Deposition of nanocomposite Zr–ZrO2 films by reactive cathodic vacuum arc evaporation

Cathodic arc evaporation is the most versatile PVD coating technology. The process uses arc evaporation to create highly ionized plasma. This permits adherent coatings to be applied to the low temperature substrates. The results of a study of the Zr–ZrO2 thin films deposition process and the technological development of cathodic arc are presented there. The studies of the oxygen flow influence and of the substrate position on film deposition were carried out. ecial substrate position in the chamber allows escaping “droplets” or macros and macro particles on the coating. ZrO2 film with nano Zr inserts is obtained in some special cases. The Zr–ZrO2 thin films were deposited on glass substrates after complete analysis of the arc deposition process. The structure and film optical properties were investigated by XRD, spectrophotometry, respectively. materials and composites can be deposited on the basis of these results.