Title of article
Anelastic relaxation processes due to hopping of interstitial oxygen in scandium
Author/Authors
Trequattrini، نويسنده , , F. and Cordero، نويسنده , , F. and Cannelli، نويسنده , , G. and Cantelli، نويسنده , , R.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
3
From page
93
To page
95
Abstract
The anelastic spectrum of the solid solution Sc–O has been investigated on a polycrystalline sample from 360 to 570 K for oxygen concentrations varying between 0.024 and 0.91 at.% O, as estimated by electrical resistivity and intentional doping. Two relaxation processes appear at 430 and 520 K for the vibration frequency of 3.5 kHz; both peaks are stable with thermal cycling and their intensities increase with the oxygen content.
ocess at lower temperature has been tentatively interpreted as due to the stress-induced hopping of oxygen atoms between the non equivalent tetrahedral and octahedral interstitial sites. A possible mechanism for the higher temperature process could be the dissolution/formation of interacting O–O pairs.
Keywords
O-relaxation , O-specific electrical resistivity
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Serial Year
2004
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Record number
2143576
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