Title of article
A TiNiPd thin film microvalve for high temperature applications
Author/Authors
Liu، نويسنده , , Y and Kohl، نويسنده , , M and Okutsu، نويسنده , , K and Miyazaki، نويسنده , , S، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
5
From page
205
To page
209
Abstract
A microvalve with high operation temperature ranging up to 120 °C is presented, which is driven by a TiNiPd thin film microactuator. Fabrication is based on a hybrid integration concept. The main fabrication technologies are magnetron sputtering, photochemical micromachining, and thin film transfer. Infrared microscopy investigations of temperature profiles and force-deflection tests are performed to determine optimum operation conditions of the TiNiPd microactuator. Gas flow measurements demonstrate control of pressure differences up to 70 kPa. The high phase transformation temperatures allow a cooling time of the microactuator of 22 ms at room temperature resulting in a maximum operation frequency of the microvalve of 30 Hz.
Keywords
Sputter deposition , Ti(Ni , Pd) thin films , Shape memory actuator , Microvalve , Smart materials
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Serial Year
2004
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Record number
2144094
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