• Title of article

    A TiNiPd thin film microvalve for high temperature applications

  • Author/Authors

    Liu، نويسنده , , Y and Kohl، نويسنده , , M and Okutsu، نويسنده , , K and Miyazaki، نويسنده , , S، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2004
  • Pages
    5
  • From page
    205
  • To page
    209
  • Abstract
    A microvalve with high operation temperature ranging up to 120 °C is presented, which is driven by a TiNiPd thin film microactuator. Fabrication is based on a hybrid integration concept. The main fabrication technologies are magnetron sputtering, photochemical micromachining, and thin film transfer. Infrared microscopy investigations of temperature profiles and force-deflection tests are performed to determine optimum operation conditions of the TiNiPd microactuator. Gas flow measurements demonstrate control of pressure differences up to 70 kPa. The high phase transformation temperatures allow a cooling time of the microactuator of 22 ms at room temperature resulting in a maximum operation frequency of the microvalve of 30 Hz.
  • Keywords
    Sputter deposition , Ti(Ni , Pd) thin films , Shape memory actuator , Microvalve , Smart materials
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: A
  • Serial Year
    2004
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: A
  • Record number

    2144094