Title of article :
Influence of the annealing conditions on the properties of InP thin films
Author/Authors :
?zta?، نويسنده , , M. and Bedir، نويسنده , , M. and Kayal?، نويسنده , , Kevin R. and Aksoy، نويسنده , , F.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
6
From page :
94
To page :
99
Abstract :
InP thin films were prepared on glass substrates by the spray pyrolysis technique. Results on structural, optical and electrical properties of the layers as a function of the thermal annealing are reported. XRD data indicates that samples show microstructural perfection improvement as a function of annealing time. The optical band-gap shows a dependence with the inverse of the squared crystallite size, suggesting that electron confinement has some effect. The lattice parameter and band-gap energy (BGE) of the samples annealed at 450 °C for 160 min (20–40–80–120–160–200) correspond to the reported values of InP thin films. In addition, the electrical resistivity measurement shows a slight decrease when annealing time is increased up to 80 min but it saturates annealing times between 80 and 160 min. Then it is slightly increased for larger times.
Keywords :
InP , Thin film , Annealing , Structural properties , Spray pyrolysis
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Serial Year :
2006
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Record number :
2144257
Link To Document :
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