On the micro-drilling and turning performance of TiN/AlN nano-multilayer films

In this study, the TiN/AlN nano-multilayer films were prepared using a new sputtering set-up, that was designed and manufactured on the basis of a newly developed technology—the high-rate reactive sputtering deposition process. This set-up featured an unbalanced magnetron sputtering system and a balanced magnetron sputtering system. The former was employed to deposit the AlN film, and the latter the TiN film. The aim of this study was to obtain, through controlled deposition conditions, a group of TiN/AlN nano-multilayer films with various periods (TiN/AlN twin-layer thickness) first, and then to investigate the influence of periods on their fundamental properties and wear behavior. Finally, two sets of field tests, micro-drilling and turning, were conducted in order to understand the feasibility of applying the multilayers on actual machining. sults revealed that through controlling of the deposition parameters, the TiN/AlN nano-multilayer films with periods ranging from 2.4 to 67.6 nm were obtained. At periods ≦3.6 nm, the multilayers had extremely high hardness, excellent adhesion and wear performance. The field tests confirmed the nano-multilayers could provide a significant improvement in actual machining performance, as compared with the traditional single-layer TiN film.