Title of article
Growth and assessment of InGaN quantum dots in a microcavity: A blue single photon source
Author/Authors
Oliver، نويسنده , , R.A. and Jarjour، نويسنده , , A.F. and Taylor، نويسنده , , R.A. and Tahraoui، نويسنده , , A. and Zhang، نويسنده , , Y. and Kappers، نويسنده , , M.J. and Humphreys، نويسنده , , C.J.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
6
From page
108
To page
113
Abstract
Using a modified droplet epitaxy approach in metal-organic vapour phase epitaxy (MOVPE), we have grown InGaN quantum dots (QDs) on top of a 20-period AlN/GaN distributed Bragg reflector (DBR). The QDs were located at the centre of a ca. 182 nm GaN layer. To complete the cavity a three-period SiOx/SiNx DBR was deposited onto the GaN surface. Despite the evolution of roughness during the growth of the AlN/GaN DBR, due to cracking of the AlN layers, a cavity mode was observed, with a quality-factor of ∼50. Enhanced single QD emission was observed in micro-photoluminescence studies of the sample, and photon-correlation spectra provided evidence for single photon emission.
Keywords
Gallium nitride , Semiconductor devices , Quantum structures
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
2008
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2145621
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