Title of article :
Memory effects in optically active CdSe nanocrystal doped MOS structures
Author/Authors :
A.W. Achtstein، نويسنده , , A.W. and Karl، نويسنده , , H. and Zhenhua، نويسنده , , S. and Stritzker، نويسنده , , B.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Pages :
5
From page :
249
To page :
253
Abstract :
We present a first study of the synthesis of CdSe nanocrystals embedded in 50 nm thick thermally grown SiO2 on p-type silicon by sequential ion implantation of Cd (30 keV) and Se (26 keV) followed by a rapid thermal annealing step. A metal-oxide-semiconductor (MOS) capacitor structure was fabricated by evaporation of an optically transparent thin Au gate electrode on top of the nanocluster doped SiO2 layer. The observed band edge emission of CdSe is fully intensity tuneable by applying a high electric field over the MOS structure. Strong hysteretic electric field enhancement and quenching of the photoluminescence (PL) was observed when sweeping the electric field strength between ±1 MV/cm. Further an electro optical memory effect was observed in this device and investigated upon its long time stability. Possible mechanisms for this behavior are discussed.
Keywords :
MOS structure , Electro optical storage , Ion implantation , Photoluminescence quenching , Nanocrystal memory device
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Serial Year :
2008
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Record number :
2145652
Link To Document :
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