Title of article
Spectroscopy of metal related levels in Ge by transient infrared and microwave absorption techniques
Author/Authors
Gaubas، نويسنده , , E. and Uleckas، نويسنده , , A. and Grigonis، نويسنده , , R. and Sirutkaitis، نويسنده , , V. and Vanhellemont، نويسنده , , J.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
3
From page
172
To page
174
Abstract
Spectral analysis of deep levels in n-Ge implanted with different fluences of Co, Fe, Ti, and Cr ions is presented using transient infrared and microwave absorption techniques at room temperature. The activation energy Ei of the deep levels observed with this novel approach, correlate rather well with those determined by capacitance-deep level transient spectroscopy (DLTS) and those extracted by simulation of the carrier recombination lifetime dependency on excitation level. It is shown that the synchronous variation of the carrier lifetime with deep level related parts of the microwave probed photo-conductivity spectrum reveals the recombination activity of specific centres.
Keywords
Germanium , Metals implantation , Photo-conductivity spectroscopy of deep levels
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Serial Year
2008
Journal title
MATERIALS SCIENCE & ENGINEERING: B
Record number
2146074
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