Title of article :
Study on the interfacial layer in ZnO/GaN heterostructure light-emitting diode
Author/Authors :
Hwang، نويسنده , , Seung-Ho and Chung، نويسنده , , Tae-Hoon and Lee، نويسنده , , Byung Teak Lee، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Pages :
4
From page :
32
To page :
35
Abstract :
Heterostructure light-emitting diodes (LEDs) were fabricated by growing Ga-doped n-ZnO and undoped ZnO layers on p-GaN/Al2O3 templates. The p–n junction showed a diode like I–V characteristic and emitted electroluminescence (EL) peaks at 430 nm, 440 nm and 480 nm along with a broad band of yellow light. An interfacial layer was observed between ZnO and GaN, identified as ZnGa2O4 by transmission electron microscopy and X-ray diffraction analysis. It was observed that thickness of the interfacial layer did not significantly affect EL characteristics of the ZnO/GaN heterostructure LED.
Keywords :
ZNO , interfacial layer , heterostructure , Sputter deposition , Light-emitting diode
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Serial Year :
2009
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Record number :
2146228
Link To Document :
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