Title of article
Observation of rapid solidification of deeply undercooled Si melts using electrostatic levitation
Author/Authors
Aoyama، نويسنده , , Tomotsugu and Paradis، نويسنده , , Paul-François and Ishikawa، نويسنده , , Takehiko and Yoda، نويسنده , , Shinichi، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
4
From page
460
To page
463
Abstract
Pure Si samples with diameters of about 1.7 mm were undercooled down to 317 K while electrostatically levitated. The crystal growth velocities were measured as a function of undercooling and the appearance of the solid/liquid interface was observed by means of a high-speed camera. The results were compared with those reported previously for larger Si droplets using an electromagnetic levitator. In this study, nucleation was triggered at a given undercooling using needle darting and particle interspersing. As a new finding, the transition of growth mechanism from a single plate to multi-plate crystal was observed at the undercooling of 80 K. Transitions from plate-like crystal to coarse faceted dendrite and from coarse to fine faceted dendrite hardly depended on the sample size.
Keywords
Silicon , Growth velocity , Electrostatic levitator , undercooling
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Serial Year
2004
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Record number
2146449
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