• Title of article

    Scaling of dislocation cells in GaAs crystals by global numeric simulation and their restraint by in situ control of stoichiometry

  • Author/Authors

    Rudolph، نويسنده , , P. and Frank-Rotsch، نويسنده , , Ch. and Juda، نويسنده , , U. and Kiessling، نويسنده , , F.-M.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2005
  • Pages
    5
  • From page
    170
  • To page
    174
  • Abstract
    Undoped GaAs crystals show dislocation cell patterns with cell dimensions of some hundred micrometer orders of magnitude larger than in metals. Nevertheless, the correlation between cell diameter and dislocation density obeys the same Holt relation. Experimental results of dislocation analysis in GaAs were correlated with global computation of the resolved shear stress distribution at growth relevant temperatures and scaled with the universal function d = Kρ−1/2 = αKGbτ−1, where d is the cell size, ρ the dislocation density, K, α the constants, G the shear modulus, b the magnitude of Burgers vector and τ is the resolved shear stress. Samples grown with in situ control of stoichiometry show nearly no dislocation patterning due to the minimised native point defect content needed for dislocation climb.
  • Keywords
    Stoichiometry , Gallium arsenide , Melt growth , Dislocation cells , Stress computing
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: A
  • Serial Year
    2005
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: A
  • Record number

    2147165