Title of article
Scaling of dislocation cells in GaAs crystals by global numeric simulation and their restraint by in situ control of stoichiometry
Author/Authors
Rudolph، نويسنده , , P. and Frank-Rotsch، نويسنده , , Ch. and Juda، نويسنده , , U. and Kiessling، نويسنده , , F.-M.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
5
From page
170
To page
174
Abstract
Undoped GaAs crystals show dislocation cell patterns with cell dimensions of some hundred micrometer orders of magnitude larger than in metals. Nevertheless, the correlation between cell diameter and dislocation density obeys the same Holt relation. Experimental results of dislocation analysis in GaAs were correlated with global computation of the resolved shear stress distribution at growth relevant temperatures and scaled with the universal function d = Kρ−1/2 = αKGbτ−1, where d is the cell size, ρ the dislocation density, K, α the constants, G the shear modulus, b the magnitude of Burgers vector and τ is the resolved shear stress. Samples grown with in situ control of stoichiometry show nearly no dislocation patterning due to the minimised native point defect content needed for dislocation climb.
Keywords
Stoichiometry , Gallium arsenide , Melt growth , Dislocation cells , Stress computing
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Serial Year
2005
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Record number
2147165
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