Properties of doped ZnO thin films grown by simultaneous dc and RF magnetron sputtering

Doped ZnO films such as Cu- and Ag-doped with different at.% have been grown using simultaneous RF magnetron sputtering of ZnO and dc sputtering of Cu and Ag. The structural, electrical and optical properties of the films are investigated using different characterization tools. It is observed that both films show different surface morphologies with preferential crystalline growth orientation along (0 0 2). More significantly Ag-doped ZnO film show low resistance and high transmittance than that of Cu-doped film of same thickness and doped content. ZnO film doped with 2 at.% Cu shows high resistivity of the order 108 Ω cm.